Design protection law searches for the right pattern : for US fashion industry
Finna-arvio
Design protection law searches for the right pattern : for US fashion industry
Tallennettuna:
| Kieli |
englanti |
|---|---|
| Sarja | Mallit |
| Luokitus | |
| Aiheet/asiasanat | |
| Lisätiedot | Mitchell C. Stein, Michael J. Student, Natalie S. Lederman |
